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What is Plasma?

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Plasma assisted physical vapour deposition

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Brazing

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Plasma Treatment of Surfaces

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Plasma Treatment of Silk

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Anti corrosion coating

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PVD coating on the inner surface of tubes

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Plasma technology in medicine.

 
SERVICES

Bangalore Plasmatek can, at present, deposit following coatings on cutting tools and other components.

Aluminium, Titanium, Nickel, Copper, Stainless steel, Gold, Silver, Special alloys, Titanium Nitride (TiN), Titanium Carbide, Titanium Carbonitride (TiCN), Multilayer coatings, Composite coatings.

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RESEARCH & DEVELOPMENT

The coating system at Bangalore Plasmatek, which includes vacuum arc and magnetron sources, was developed indigenously. The processes for various coatings are also developed in house.

Bangalore Plasmatek enjoys taking up challenging research and development projects.

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Technology


BPT has developed two techniques – magnetron sputtering and steered cathodic arc. See Plasma Assisted Physical vapour deposition (PAPVD  or PVD) for details. This process of coating thin films is also called ion plating. In the absence of any reactive gas these processes are used to deposit films of pure metals and alloys. This is known as metallization. Using reactive gases like nitrogen, acetylene, methane, oxygen etc nitrides, oxides and carbides of metals are deposited. This is called reactive deposition.
 

Multilayer and alloy coatings are deposited using two or more cathodes concurrently. Cathode size can vary from 40 mm to 500 mm. It is thus possible to coat large substrates. Rotary jigs ensure almost uniform coating. Good adhesion is achieved by cleaning the substrates in situ by ion etching. Glow discharge in argon as well as energetic ions from the cathodic arc are used for ion etching.

Why Plasma?
The ionised particles in the plasma provide excellent conditions for depositing high quality films. The advantages are:

  1. Plasma simultaneously cleans and heats the substrates. This promotes good bonding of the films with the substrates.

  2. Ions in the plasma continuously bombard the film during its growth. This makes the film dense. Controlling the energy of the bombarding ions it is possible to control the structure of the film.

  3. Plasma helps in depositing the films at lower temperatures compared to other methods like CVD.

  4. Certain coatings like DLC are possible only with plasma technologies.

  5. Unlike electroplating, plasma technology does not use hazardous chemicals and is environment friendly. 

 

 


 


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